The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Mar. 31, 2020
Lam Research Corporation, Fremont, CA (US);
Patrick Breiling, Portland, OR (US);
Ramesh Chandrasekharan, Portland, OR (US);
Karl Leeser, West Linn, OR (US);
Paul Konkola, West Linn, OR (US);
Adrien LaVoie, Newberg, OR (US);
Chloe Baldasseroni, Portland, OR (US);
Shankar Swaminathan, Beaverton, OR (US);
Ishtak Karim, Portland, OR (US);
Yukinori Sakiyama, West Linn, OR (US);
Edmund Minshall, Sherwood, OR (US);
Sung Je Kim, Beaverton, OR (US);
Andrew Duvall, Tualatin, OR (US);
Frank Pasquale, Beaverton, OR (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A pedestal for a substrate processing system includes a pedestal body including a substrate-facing surface. An annular band is arranged on the substrate-facing surface that is configured to support a radially outer edge of the substrate. A cavity is defined in the substrate-facing surface of the pedestal body and is located radially inside of the annular band. The cavity creates a volume between a bottom surface of the substrate and the substrate-facing surface of the pedestal body. A plurality of vents pass though the pedestal body and are in fluid communication with the cavity to equalize pressure on opposing faces of the substrate during processing.