Company Filing History:

11 out of 993

Novellus Systems Incorporated

patents

2 out of 3,768

Lam Research Corporation

patents

1 out of 832,680

Other

patents

Years Active: 2004-2022

where 'Filed Patents' based on already Granted Patents

14 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11443975 - Planar substrate edge contact with open volume equalization pathways and side containment (2022-09-13),

2. 10622243 - Planar substrate edge contact with open volume equalization pathways and side containment (2020-04-14),

3. 10115608 - Method and apparatus for rapid pump-down of a high-vacuum loadlock (2018-10-30),

4. 9758868 - Plasma suppression behind a showerhead through the use of increased pressure (2017-09-12),

5. 8415261 - Capping before barrier-removal IC fabrication method (2013-04-09),

6. 8257781 - Electroless plating-liquid system (2012-09-04),

7. 8043958 - Capping before barrier-removal IC fabrication method (2011-10-25),

8. 7811925 - Capping before barrier-removal IC fabrication method (2010-10-12),

9. 7690324 - Small-volume electroless plating cell (2010-04-06),

10. 7605082 - Capping before barrier-removal IC fabrication method (2009-10-20),

11. 7229339 - CMP apparatus and method (2007-06-12),

12. 7048316 - Compound angled pad end-effector (2006-05-23),

13. 6815349 - Electroless copper deposition apparatus (2004-11-09),

14. 6755954 - Electrochemical treatment of integrated circuit substrates using concentric anodes and variable field shaping elements (2004-06-29),

Title: The Innovative Journey of Edmund Minshall

Introduction

Edmund Minshall, an accomplished inventor based in Sherwood, Oregon, has made significant contributions to the field of substrate processing systems. With a total of 14 patents to his name, he has consistently pushed the boundaries of technology, focusing on innovations that enhance performance and efficiency in manufacturing processes.

Latest Patents

Among his notable inventions are two patents that showcase his expertise in substrate processing. The first patent, titled "Planar substrate edge contact with open volume equalization pathways and side containment," involves a pedestal for a substrate processing system. This invention features a pedestal body with a substrate-facing surface that supports the outer edge of a substrate using an annular band. A cavity defined in the pedestal body creates a volume between the substrate's bottom surface and the pedestal surface, while multiple vents are incorporated to equalize pressure during processing. This design optimizes substrate handling and processing efficiency.

Career Highlights

Edmund Minshall has held positions at several prominent companies, including Novellus Systems Incorporated and Lam Research Corporation. His work in these leading organizations has enabled him to develop innovative solutions that address complex challenges in substrate processing technology, contributing to the advancement of the semiconductor manufacturing industry.

Collaborations

Throughout his career, Minshall has collaborated with esteemed peers, including Steven T. Mayer and R. Marshall Stowell. These collaborations have fostered a rich environment of innovation, facilitating the development of groundbreaking technologies in the field.

Conclusion

Edmund Minshall's journey as an inventor reflects his commitment to advancing the technology used in substrate processing systems. With 14 patents highlighting his innovative spirit and contributions to notable companies, he continues to be a key figure in his field. His work stands as a testament to the impact of dedicated inventors in shaping the future of technology.

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