The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Sep. 13, 2018
Lam Research Corporation, Fremont, CA (US);
Purushottam Kumar, Hillsboro, OR (US);
Hu Kang, Tualatin, OR (US);
Adrien LaVoie, Newberg, OR (US);
Yi Chung Chiu, Taipei, TW;
Frank L. Pasquale, Beaverton, OR (US);
Jun Qian, Sherwood, OR (US);
Chloe Baldasseroni, Tigard, OR (US);
Shankar Swaminathan, Beaverton, OR (US);
Karl F. Leeser, West Linn, OR (US);
David Charles Smith, Lake Oswego, OR (US);
Wei-Chih Lai, Yilan County, TW;
Lam Research Corporation, Fremont, CA (US);
Abstract
The present inventors have conceived of a multi-stage process gas delivery system for use in a substrate processing apparatus. In certain implementations, a first process gas may first be delivered to a substrate in a substrate processing chamber. A second process gas may be delivered, at a later time, to the substrate to aid in the even dosing of the substrate. Delivery of the first process gas and the second process gas may cease at the same time or may cease at separate times.