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Hu Kang

This inventor holds 50 USPTO granted patents and 11 published patent applications, primarily in Atomic Layer Deposition. Top assignees: Lam Research Corporation, Novellus Systems Incorporated. Active years: 2012-2025.

USPTO Granted Patents = 50 (Patent Applications = 11)

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 15

Forward Citations = 3,924(Granted Patents)

Forward Citations (Not Self Cited) = 3,703(Dec 10, 2025)

Company Filing History:

41 out of 3,932

Lam Research Corporation

patents

9 out of 993

Novellus Systems Incorporated

patents

Years Active: 2012-2025

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Areas of Expertise:

Atomic Layer Deposition

Precursor Dosing

Film Uniformity

Thickness Control

CVD Techniques

Plasma Suppression

Substrate Processing

Vapor Delivery

Wafer Deposition

Aspect Ratio Features

Sensitive Substrates

Low Volume Showerhead

50 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12448687 - Dynamic precursor dosing for atomic layer deposition (2025-10-21),

2. 12354871 - Ultrathin atomic layer deposition film accuracy thickness control (2025-07-08),

3. 12261038 - Gapfill of variable aspect ratio features with a composite PEALD and PECVD method (2025-03-25),

4. 11970772 - Dynamic precursor dosing for atomic layer deposition (2024-04-30),

5. 11670503 - Method of atomic layer deposition (2023-06-06),

6. 11646198 - Ultrathin atomic layer deposition film accuracy thickness control (2023-05-09),

7. 11479856 - Multi-cycle ALD process for film uniformity and thickness profile modulation (2022-10-25),

8. 11434567 - Substrate processing system with tandem source activation for CVD (2022-09-06),

9. 11180850 - Dynamic precursor dosing for atomic layer deposition (2021-11-23),

10. 11133180 - Gapfill of variable aspect ratio features with a composite PEALD and PECVD method (2021-09-28),

11. 11127567 - Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity (2021-09-21),

12. 11101129 - Ultrathin atomic layer deposition film accuracy thickness control (2021-08-24),

13. 10741458 - Methods for depositing films on sensitive substrates (2020-08-11),

14. 10741365 - Low volume showerhead with porous baffle (2020-08-11),

15. 10665429 - Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity (2020-05-26),

Title: Inventor Hu Kang: Revolutionizing Technology in Tualatin

Introduction: Hu Kang is a visionary inventor based in Tualatin, Oregon, known for his groundbreaking contributions to the field of technology.

Latest Patents: Hu Kang holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Hu Kang has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have had a significant impact on various industries.

Collaborations: Throughout his career, Hu Kang has collaborated with top engineers, scientists, and researchers, fostering a culture of innovation and creativity that has led to the successful development of numerous groundbreaking technologies.

Conclusion: Hu Kang's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology in Tualatin and beyond.

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