Yilan, Taiwan

Wei-Chih Lai

This inventor holds 2 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2018-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei-Chih Lai. Retrieved from https://idiyas.com/inventor/wei-chih-lai-6ufilbrp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2018-2020

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2 patents (USPTO):Explore Patents

Title: Innovations by Wei-Chih Lai

Introduction

Wei-Chih Lai is a notable inventor based in Yilan County, Taiwan. He has made significant contributions to the field of substrate processing, particularly in improving film uniformity. With a total of 2 patents to his name, his work has garnered attention in the industry.

Latest Patents

Wei-Chih Lai's latest patents focus on a multi-stage process gas delivery system designed for use in substrate processing apparatuses. The first patent involves a method where a first process gas is delivered to a substrate in a processing chamber. Subsequently, a second process gas is introduced to ensure even dosing of the substrate. This innovative approach allows for the simultaneous or separate cessation of gas delivery, enhancing the overall efficiency of the process.

Career Highlights

Wei-Chih Lai is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his inventive ideas in practical applications, contributing to advancements in technology.

Collaborations

Some of his notable coworkers include Purushottam Kumar and Hu Kang. Their collaboration has likely fostered an environment of innovation and creativity within their projects.

Conclusion

Wei-Chih Lai's contributions to substrate processing technology through his patents demonstrate his commitment to innovation. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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