Kaohsiung, Taiwan

Ching-Ling Lin

This inventor holds 30 USPTO granted patents and 8 published patent applications, primarily in Semiconductor Fabrication. Top assignee: United Microelectronics Corp.. Active years: 2014-2026.

USPTO Granted Patents = 30 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 7

Forward Citations = 136(Granted Patents)


Location History:

  • Kaoshiung, TW (2017)
  • Kaohsiung, TW (2014 - 2024)

Company Filing History:


Years Active: 2014-2026

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Areas of Expertise:
Semiconductor Structure
Metal Gate Structure
Planarization Method
Fabrication Method
Interlayer Dielectric
Patterned Metal Layer
Contact Plug
Self-Aligned Metal Gate
Dummy Gate Structure
Cleaning Contact Hole
Thermal Management
3D Stacking
30 patents (USPTO):Explore Patents

Title: The Innovative Journey of Ching-Ling Lin

Introduction: Ching-Ling Lin, a pioneering inventor hailing from Kaohsiung, Taiwan, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Ching-Ling Lin holds several patents in the areas of renewable energy technologies and sustainable materials, showcasing his commitment to creating a greener future for generations to come.

Career Highlights: Throughout his illustrious career, Ching-Ling Lin has been recognized for his innovative spirit and dedication to pushing the boundaries of traditional technology. His inventions have revolutionized industries and paved the way for new advancements in science.

Collaborations: Ching-Ling Lin has collaborated with leading research institutions and universities around the world to further develop his inventions and bring them to market. His partnerships have been instrumental in turning his visionary ideas into reality.

Conclusion: In conclusion, Ching-Ling Lin stands as a beacon of innovation in the world of technology, inspiring others to think outside the box and pursue their inventive dreams. His legacy will continue to shape the future of technology and drive progress in the years to come.

Profile summary based on public USPTO records.
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