Hsinchu, Taiwan

Chih-Yuan Yang

USPTO Granted Patents = 12 

Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2004-2025

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Chih-Yuan Yang: Innovator in Chemical Mechanical Polishing

Introduction

Chih-Yuan Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 12 patents to his name. His innovative approaches have advanced the technology used in semiconductor manufacturing.

Latest Patents

One of his latest patents is a "Vacuum assembly for chemical mechanical polishing." This method involves depositing a slurry onto a polishing pad at a CMP station. A workpiece is polished, and the polishing by-products and slurry are removed from the polishing pad using a vacuum head. The CMP apparatus includes a polishing pad that rotates during the CMP process, along with a slurry dispenser that deposits slurry onto the polishing surface. Additionally, the apparatus features a momentum vacuum assembly with a slotted opening facing the polishing surface, and a suction line that transports polishing products removed from the pad.

Another notable patent is the "Method and system for performing chemical mechanical polishing." This method secures a wafer in a carrier head, which includes a housing enclosing the wafer. The housing has a retainer ring that surrounds the wafer, with a bottom surface that features engraved and non-engraved regions. The process involves pressing the wafer against a polishing pad and moving the carrier head or the polishing pad relative to each other.

Career Highlights

Chih-Yuan Yang has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Altek Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in CMP technology.

Collaborations

Throughout his career, Chih-Yuan Yang has collaborated with talented individuals such as Yu-Chen Wei and Shih-Ho Lin. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Chih-Yuan Yang's contributions to the field of chemical mechanical polishing have established him as a key figure in semiconductor manufacturing. His innovative patents and collaborations continue to influence the industry and drive technological advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…