The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Aug. 21, 2012
Chih-i Peng, Hsinchu, TW;
Hsiang-pi Chang, New Taipei, TW;
Cary Chia-chiung Lo, Taipei, TW;
Teng-chun Tsai, Tainan, TW;
Kuo-yin Lin, Hsinchu County, TW;
Chih-yuan Yang, Hsinchu, TW;
Chih-I Peng, Hsinchu, TW;
Hsiang-Pi Chang, New Taipei, TW;
Cary Chia-Chiung Lo, Taipei, TW;
Teng-Chun Tsai, Tainan, TW;
Kuo-Yin Lin, Hsinchu County, TW;
Chih-Yuan Yang, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A chemical mechanical polishing (CMP) chamber is disclosed. The CMP chamber includes a chamber body, a door mounted on the chamber body and a chamber substructure being one selected from a group consisting of a moisture separator separating a moisture generated in the CMP chamber, a supplementary exhaust port, a transparent window mounted on the door, a sampling port mounted on the door, a sealing material including a metal frame, an o-ring for sealing the door and a combination thereof.