This inventor holds 28 USPTO granted patents and 3 published patent applications, primarily in Plasma Semiconductor Processing. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Cortina Systems Corporation, Cortina Access, Inc.. Active years: 1998-2026.
Location History:
- Taipei Hsien, TW (1998)
- Zhubei, TW (2015)
- Hsin-Chu, TW (2004 - 2024)
Company Filing History:
25 out of 42,810Â 
2 out of 58Â 
1 out of 4Â Years Active: 1998-2026
Areas of Expertise:
Title: Innovations and Contributions of Chih-Hsien Hsu in Plasma Treatment Technologies
Introduction: Chih-Hsien Hsu, an accomplished inventor based in Hsinchu, Taiwan, holds an impressive portfolio of 21 patents. His work focuses primarily on advancements in plasma treatment systems, contributing significantly to the fields of semiconductor manufacturing and materials processing.
Latest Patents: Among his latest innovations are two notable patents that reflect his dedication to enhancing plasma treatment technologies. The first patent, titled "Methods and systems for cooling plasma treatment components," describes innovative methods for uniformly cooling the dome within a plasma treatment system. This technology utilizes a diffuser with a perforated plate that includes a central portion and multiple arrays of holes, facilitating the distribution of cooling gas across the dome's surface more effectively.
His second patent, "Devices and methods for controlling wafer uniformity in plasma-based processes," unveils a device designed to enhance wafer uniformity during plasma processing. The device comprises a housing defining a process chamber and a gas distribution plate configured to evenly distribute process gas. These developments significantly contribute to improving the efficiency and accuracy of plasma-based manufacturing processes.
Career Highlights: Chih-Hsien Hsu has made substantial contributions to the semiconductor industry through his work at prominent companies like Taiwan Semiconductor Manufacturing Company Ltd. and Cortina Systems Corporation. His experience at these organizations has allowed him to pioneer new solutions and optimize existing processes, cementing his role as a forward-thinking inventor in this competitive field.
Collaborations: Throughout his career, Hsu has collaborated with talented professionals, including Jr-Sheng Chen and Yu-Pei Chiang. These partnerships have fostered innovation and facilitated the successful development of his patents, showcasing the importance of teamwork in driving technological progress.
Conclusion: In summary, Chih-Hsien Hsu stands out as a leading inventor in plasma treatment technologies. His innovative patents reflect a commitment to enhancing semiconductor manufacturing processes, with a focus on efficiency and uniformity. Through collaboration and extensive industry experience, Hsu continues to make strides in advancing technology for the future.