IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11562968 B1

PDFFull Text
Date of Patent:
Jan. 24, 2023

Filed:

May. 03, 2019

Apparatus for lithographically forming wafer identification marks and alignment marks

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Hu-Wei Lin, Hsinchu, TW;

Chih-Hsien Hsu, Hsinchu, TW;

Yu-Wei Chiu, Pingtung, TW;

Hai-Yin Chen, Taipei, TW;

Ying-Hao Wang, Tainan, TW;

Yu-Hen Wu, Zhubei, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Attorney:

Eschweiler & Potashnik, LLC

Primary Examiner:

Alia Sabur

Int. Cl.
CPC ...
H01L 23/544 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); H01L 21/67 (2006.01); F21K 9/00 (2016.01); G03F 9/00 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); G03F 7/20 (2013.01); G03F 7/2002 (2013.01); G03F 7/70 (2013.01); G03F 7/7005 (2013.01); G03F 7/7045 (2013.01); G03F 7/70075 (2013.01); G03F 7/70141 (2013.01); G03F 7/70466 (2013.01); G03F 7/70541 (2013.01); G03F 7/70733 (2013.01); H01L 21/0274 (2013.01); H01L 21/3086 (2013.01); H01L 21/67282 (2013.01); F21K 9/00 (2013.01); G03F 7/70991 (2013.01); G03F 9/708 (2013.01); H01L 21/0273 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54433 (2013.01);
Abstract

The present disclosure relates a lithographic substrate marking tool. The tool includes a first electromagnetic radiation source disposed within a housing and configured to generate a first type of electromagnetic radiation. A radiation guide is configured to provide the first type of electromagnetic radiation to a photosensitive material over a substrate. A second electromagnetic radiation source is disposed within the housing and is configured to generate a second type of electromagnetic radiation that is provided to the photosensitive material.

Find Patent Forward Citations

Loading…