Company Filing History:
Years Active: 2015-2025
Title: The Innovative Genius of Hu-Wei Lin
Introduction
Hu-Wei Lin, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of lithography. With a remarkable portfolio of six patents, he has established himself as a leading figure in the semiconductor industry. His work focuses on developing advanced marking tools that enhance manufacturing processes in semiconductor fabrication.
Latest Patents
Among Hu-Wei Lin's latest innovations are two noteworthy patents. The first patent, titled "Apparatus for lithographically forming wafer identification marks and alignment marks," details a sophisticated lithographic substrate marking tool. This tool utilizes a first electromagnetic radiation source to produce a particular type of electromagnetic radiation, directing it through a radiation guide to a photosensitive material over a substrate. It also includes a second electromagnetic radiation source for further enhancement of the marking process.
The second patent, "Lithography engraving machine for forming wafer identification marks and alignment marks," describes a lithographic substrate marking tool that incorporates a first lithographic exposure tool and a mobile reticle. This innovative design allows for multiple exposure techniques to create distinct substrate identification marks effectively. The use of a mobile reticle enables the economic production of various identification marks using a single reticle, optimizing the lithographic substrate marking process.
Career Highlights
Hu-Wei Lin is currently affiliated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a renowned leader in semiconductor manufacturing. His expertise and inventive spirit have directly contributed to advancements in the production techniques used in the semiconductor industry, significantly enhancing productivity and efficiency.
Collaborations
In his professional journey, Hu-Wei Lin has collaborated with esteemed colleagues, including Chih-Hsien Hsu and Yu-Wei Chiu. Together, they have combined their expertise to further innovate in various lithographic technologies, pushing the boundaries of what is possible in semiconductor fabrication.
Conclusion
With his impressive track record of patents and a commitment to innovation, Hu-Wei Lin continues to shape the future of lithography in the semiconductor industry. His contributions play a vital role in improving manufacturing capabilities, ensuring that TSMC remains at the forefront of technological advancements. As technology evolves, Hu-Wei Lin's work will undoubtedly have a lasting impact on the industry and pave the way for future innovations.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.