The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
Feb. 14, 2022
Applicant:
Taiwan Semiconductor Manufacturing Company, Hsinchu, TW;
Inventors:
Cheng Kuang Tso, Hsinchu, TW;
Chou-Feng Lee, Hsinchu, TW;
Chih-Hsien Hsu, Hsinchu, TW;
Chung-Hsiu Cheng, Banqiao, TW;
Jr-Sheng Chen, Hsinchu, TW;
Assignee:
Taiwan SemiConductor Manufacturing Company, LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/32522 (2013.01); H01L 21/3065 (2013.01); H01J 2237/334 (2013.01);
Abstract
Methods and systems for uniformly cooling a dome within a plasma treatment system are disclosed. The methods and systems utilize a diffuser including a perforated plate and a cone. The perforated plate includes a center portion and multiple arrays of holes with each array being located circumferentially at a different distance from the center. The cone extends away from the center. The diffuser spreads cooling gas more uniformly across the surface of the dome.