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For the Inventor, By the Inventor

Hsinchu, Taiwan

Jr-Sheng Chen

USPTO Granted Patents = 12 

Average Co-Inventor Count = 6.3

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:

goldMedal12 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2018-2025

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12 patents (USPTO):Explore Patents
1. 12463016 - Devices and methods for controlling wafer uniformity in plasma-based process (2025-11-04),
2. 12412734 - Baffle plate for controlling wafer uniformity and methods for making the same (2025-09-09),
3. 12062523 - Methods and systems for cooling plasma treatment components (2024-08-13),
4. 11769652 - Devices and methods for controlling wafer uniformity in plasma-based process (2023-09-26),
5. 11615946 - Baffle plate for controlling wafer uniformity and methods for making the same (2023-03-28),
6. 10964547 - Method of fabricating semiconductor structure (2021-03-30),
7. 10957516 - Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP (2021-03-23),
8. 10654713 - Method for manufacturing microelectromechanical system structure having a cavity and through-holes of different widths (2020-05-19),
9. 10529578 - Method of fabricating semiconductor structure (2020-01-07),
10. 10273152 - Method for manufacturing microelectromechanical system structure having a cavity and through-holes of different widths (2019-04-30),
11. 10131539 - Method for forming micro-electro-mechanical system (MEMS) device structure (2018-11-20),
12. 9997336 - Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP (2018-06-12),

Title: Innovations of Jr-Sheng Chen in Semiconductor Technology

Introduction

Jr-Sheng Chen is a prominent inventor based in Hsinchu, Taiwan, known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, he has made remarkable advancements in the field, particularly in methods and devices that enhance wafer uniformity during plasma-based processes.

Latest Patents

One of his latest patents is titled "Baffle plate for controlling wafer uniformity and methods for making the same." This invention discloses devices and methods for controlling wafer uniformity using a gas baffle plate. The device includes a housing that defines a process chamber and a baffle plate arranged above a wafer within that chamber. The baffle plate is specifically designed to control plasma distribution on the wafer, featuring an annular shape that consists of a first and a second annulus sector, each with different inner radii. Another notable patent is "Methods and systems for cooling plasma treatment components." This invention outlines methods and systems for uniformly cooling a dome within a plasma treatment system, utilizing a diffuser that includes a perforated plate and a cone to spread cooling gas more evenly across the dome's surface.

Career Highlights

Jr-Sheng Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on developing innovative solutions that improve the efficiency and effectiveness of semiconductor manufacturing processes. His expertise

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