Chung-Hsiu Cheng

Title: Innovations by Chung-Hsiu Cheng

Introduction

Chung-Hsiu Cheng is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving processes and systems within plasma treatment and semiconductor wafer processing.

Latest Patents

Cheng's latest patents include innovative methods and systems for cooling plasma treatment components. These methods utilize a diffuser that includes a perforated plate and a cone, designed to spread cooling gas more uniformly across the surface of the dome within a plasma treatment system. Another notable patent is a method for wafer backside cooling, which involves placing a semiconductor wafer on a wafer chuck and supplying a cooling gas to the backside of the wafer through a groove and ventilation apertures.

Career Highlights

Chung-Hsiu Cheng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise in cooling systems and plasma treatment processes has positioned him as a valuable asset in the industry.

Collaborations

Cheng collaborates with talented coworkers, including Chih-Hsien Hsu and Pin-Yi Hsin, contributing to a dynamic team focused on advancing semiconductor technologies.

Conclusion

Chung-Hsiu Cheng's innovative work in semiconductor technology and his contributions to cooling systems demonstrate his commitment to advancing the field. His patents reflect a deep understanding of the complexities involved in semiconductor processing, making him a noteworthy inventor in the industry.