Chih-Hsiang Huang

Title: Chih-Hsiang Huang: Innovator in Semiconductor Technology

Introduction

Chih-Hsiang Huang is a prominent inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His innovative work focuses on advanced fabrication methods and device structures that enhance the performance of semiconductor devices.

Latest Patents

Among his latest patents is a method for fabricating a multi-gate device. This method involves providing a fin element in a device region and forming a dummy gate over the fin element. The process includes forming a source/drain feature within a source/drain region adjacent to the dummy gate, with specific dopant implants to optimize the device's performance. Another notable patent involves semiconductor devices with a threshold voltage modulation layer. This method comprises forming fins with alternating channel and sacrificial layers, followed by the creation of a metal gate stack that enhances the device's functionality.

Career Highlights

Chih-Hsiang Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the technology used in modern electronic devices. His innovative approaches have not only contributed to the company's success but have also set new standards in semiconductor manufacturing.

Collaborations

Chih-Hsiang Huang has collaborated with notable colleagues such as Shih-Hao Lin and Szu-Chi Yang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor field.

Conclusion

Chih-Hsiang Huang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of electronic devices and semiconductor manufacturing.