Location History:
- New Taipei, TW (2015 - 2023)
- Hsinchu, TW (2018 - 2023)
Company Filing History:
Years Active: 2015-2025
Areas of Expertise:
Title: Profile of Inventor Chia-Hua Lin
Introduction: Chia-Hua Lin is an accomplished inventor based in New Taipei, Taiwan, recognized for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 43 patents, Lin has established himself as a thought leader and innovator in developing advanced integrated circuits.
Latest Patents: Among his notable inventions, Lin's latest patents include a "Sidewall spacer structure for memory cell," which showcases an integrated chip design featuring a memory cell within a dielectric structure. This memory cell comprises a data storage element situated between a bottom electrode and a top electrode, with an innovative upper conductive structure and a unique sidewall spacer structure to enhance performance and reliability in semiconductor applications. Additionally, he has developed a "Socket for extension cord," which reflects his practical approach to addressing everyday challenges through inventive solutions.
Career Highlights: Lin has made a remarkable impact in the semiconductor industry, particularly during his tenure at Taiwan Semiconductor Manufacturing Company (TSMC). His work has greatly influenced the design and functionality of memory cells used in various electronic devices, positioning him among the forefront inventors in the tech sector.
Collaborations: Throughout his career, Lin has collaborated with several distinguished colleagues, including Yao-Wen Chang and Tzu-Chung Tsai. These partnerships have contributed to his innovative spirit, fostering an environment of creativity and excellence in research and development.
Conclusion: Chia-Hua Lin’s extensive patent portfolio and collaborative efforts reflect his dedication to advancing technology within the semiconductor industry. As he continues to innovate, his work will likely inspire future generations of inventors and contribute significantly to technological progress.