The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Jul. 26, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chia-Hua Lin, New Taipei, TW;

Hsun-Chung Kuang, Hsinchu, TW;

Yu-Hsing Chang, Taipei, TW;

Yao-Wen Chang, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10H 20/01 (2025.01); H10H 20/832 (2025.01); H10H 20/856 (2025.01); H10H 29/14 (2025.01); H10K 59/123 (2023.01); H10K 59/80 (2023.01); H10H 20/857 (2025.01);
U.S. Cl.
CPC ...
H10H 29/142 (2025.01); H10H 20/835 (2025.01); H10H 20/856 (2025.01); H10K 59/123 (2023.02); H10K 59/80518 (2023.02); H10H 20/0364 (2025.01); H10H 20/857 (2025.01);
Abstract

In some embodiments, the present disclosure relates to a display device that includes a reflector electrode coupled to an interconnect structure. An isolation structure is disposed over the reflector electrode, and a transparent electrode is disposed over the isolation structure. Further, an optical emitter structure is disposed over the transparent electrode. A via structure extends from a top surface of the isolation structure to the reflector electrode and comprises an outer portion that directly overlies the top surface of the isolation structure. A hard mask layer is arranged directly between the top surface of the isolation structure and the outer portion of the via structure.


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