Hsinchu, Taiwan

Chi-On Chui

This inventor holds 55 USPTO granted patents and 15 published patent applications, primarily in Semiconductor Devices. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chi-On Chui. Retrieved from https://idiyas.com/inventor/chi-on-chui-we6dqh30

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 55 

% Patents Active = 100.0

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 2018-2026

Loading Chart...
Areas of Expertise:
Semiconductor Device
FinFET
Air Gap Formation
Hardmask
RC Delay
High Aspect Ratio
Negative Capacitance
Salicide Layer
Gate Stack
Monoatomic Etch Stop
Fabrication Method
Structure Formation
55 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Chi-On Chui

Introduction: Chi-On Chui, a talented inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Chi-On Chui holds several patents in the areas of semiconductor technology and electronic devices, showcasing his expertise and creativity in these fields.

Career Highlights: Throughout his career, Chi-On Chui has demonstrated a remarkable ability to translate complex ideas into practical inventions. His work has not only pushed the boundaries of technology but has also paved the way for future advancements in the industry.

Collaborations: Chi-On Chui has collaborated with leading research institutions and technology companies to further develop and commercialize his inventions. His partnerships have been instrumental in bringing his ideas to life and making a tangible impact on the world.

Conclusion: In conclusion, Chi-On Chui stands as a visionary inventor whose passion for innovation and dedication to his craft have solidified his place as a key figure in the world of technology. His contributions continue to inspire and shape the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…