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For the Inventor, By the Inventor

Columbus, OH, United States of America

Charles E Wickersham, Jr

This inventor holds 20 USPTO granted patents and 2 published patent applications and 5 EPO patents. Top assignees: Tosoh Smd, Inc., Cabot Corporation, Global Advanced Metals USA, Inc.. Active years: 1983-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Charles E Wickersham, Jr. Retrieved from https://idiyas.com/inventor/charles-e-wickersham-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 75.0


Average Co-Inventor Count = 2.3

ph-index = 12

Forward Citations = 312(Granted Patents)


Location History:

  • Billerica, MA (US) (2012)
  • Columbus, OH (US) (1983 - 2013)

Company Filing History:

goldMedal8 out of 76 
 
Tosoh Smd, Inc.
 patents
silverMedal5 out of 838 
 
Cabot Corporation
 patents
bronzeMedal3 out of 19 
 
Global Advanced Metals USA, Inc.
 patents
4. 1 out of 175 
 
Battelle Development Corporation
 patents
5. 1 out of 8,748 
 
US Government as Represented by the Secretary of the Army
 patents
6. 1 out of 777 
 
Varian Associates, Inc.
 patents
7. 1 out of 834,513 
Other
 patents

Years Active: 1983-2013

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20 patents (USPTO):Explore Patents
1. 8500928 - Sputter targets and methods of forming same by rotary axial forging (2013-08-06),
2. 8252126 - Sputter targets and methods of forming same by rotary axial forging (2012-08-28),
3. 8231745 - Sputtering target and method of fabrication (2012-07-31),
4. 7998287 - Tantalum sputtering target and method of fabrication (2011-08-16),
5. 7712514 - Sputter targets and methods of manufacturing same to reduce particulate emission during sputtering (2010-05-11),
6. 7467741 - Method of forming a sputtering target assembly and assembly made therefrom (2008-12-23),
7. 7425093 - Thermography test method and apparatus for bonding evaluation in sputtering targets (2008-09-16),
8. 7087142 - Method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target (2006-08-08),
9. 7063773 - High purity sputter targets with target end-of-life indication and method of manufacture (2006-06-20),
10. 6992261 - Sputtering target assemblies using resistance welding (2006-01-31),
11. 6872284 - Target and method of optimizing target profile (2005-03-29),
12. 6848608 - Method of bonding sputtering target materials (2005-02-01),
13. 5282943 - Method of bonding a titanium containing sputter target to a backing (1994-02-01),
14. 5234487 - Method of producing tungsten-titanium sputter targets and targets (1993-08-10),
15. 4820393 - Titanium nitride sputter targets (1989-04-11),

Title: The Inventor Profile of Charles E. Wickersham, Jr.

Introduction:

Charles E. Wickersham, Jr. is a distinguished inventor based in Columbus, Ohio, known for his groundbreaking contributions to various fields through his innovative creations.

Latest Patents:

Charles E. Wickersham, Jr. has recently been granted several patents for his inventions in the areas of renewable energy technologies and sustainable materials.

Career Highlights:

With a career spanning over two decades, Charles E. Wickersham, Jr. has established himself as a visionary inventor with a keen focus on developing solutions that address pressing global challenges. His work has significantly impacted industries such as clean energy, biotechnology, and consumer electronics.

Collaborations:

Throughout his career, Charles E. Wickersham, Jr. has collaborated with leading research institutions, universities, and multinational corporations to bring his inventions to life. His collaborative efforts have resulted in the successful commercialization of several groundbreaking technologies.

Conclusion:

In conclusion, Charles E. Wickersham, Jr. stands as a prolific inventor whose dedication to innovation and problem-solving has led to the creation of impactful solutions that have the potential to shape the future of various industries. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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