The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Dec. 01, 2008
Charles E. Wickersham, Jr., Columbus, OH (US);
John E. Poole, Grove City, OH (US);
Alexander Leybovich, Hilliard, OH (US);
Lin Zhu, Grove City, OH (US);
Charles E. Wickersham, Jr., Columbus, OH (US);
John E. Poole, Grove City, OH (US);
Alexander Leybovich, Hilliard, OH (US);
Lin Zhu, Grove City, OH (US);
Tosoh SMD, Inc., Grove City, OH (US);
Abstract
Methods for reducing inclusion content of sputter targets and targets so produced are disclosed. Inclusions may be reduced by adding a small amount of Si to the molten Al or molten Al alloy followed by filtering of the molten metals through a filter medium. Targets having substantially no inclusions therein of greater than about 400 μm are especially useful in the sputtering of large flat panel displays and result, upon sputtering, in a reduction in the amount of macroparticles sputtered onto the substrate.