Suwon, South Korea

Chang-jin Kang


Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 63(Granted Patents)


Location History:

  • Kyunki-do, KR (2001)
  • Kyungki-do, KR (2000 - 2003)
  • Suwon, KR (2005 - 2009)
  • Seongnam-si, KR (2007 - 2010)

Company Filing History:


Years Active: 2000-2010

Loading Chart...
15 patents (USPTO):

Title: Chang-jin Kang: Innovator in Semiconductor Technology

Introduction

Chang-jin Kang is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His innovative approaches have advanced the methods used in semiconductor device fabrication.

Latest Patents

One of his latest patents is a method of forming a semiconductor device. This method includes forming a first mask pattern on a target layer, which exposes a first portion of the target layer. It involves forming an intermediate material layer by depositing an intermediate material layer film on a side of the first mask pattern and the first portion of the target layer. The intermediate material layer film is then thinned to create the intermediate material layer. Following this, a second mask pattern is formed that exposes a second portion of the intermediate material layer. The exposed second portion is removed to reveal the target layer, and the target layer is patterned using both the first and second mask patterns as patterning masks.

Another notable patent is related to the method of forming a fine contact hole and fabricating a semiconductor device using block copolymers. This method includes forming a plurality of lower patterns on a substrate, followed by the formation of an insulation layer on these lower patterns. A self-assemble induction layer is created on the insulation layer, and a recess is formed in the self-assemble induction layer in alignment with the lower patterns. A block copolymer layer is then formed in the recess, creating a polymer domain at a distance from the sidewall of the recess, surrounded by a polymer matrix. The polymer domain is subsequently removed, and the self-assemble induction layer is etched using the polymer matrix as a mask to form an opening that exposes the insulation layer. Finally, the insulation layer exposed by the opening is etched to create a contact hole.

Career Highlights

Chang-jin Kang is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.

Collaborations

He has collaborated with notable coworkers, including Kyeong-Koo Chi and Seung-Young Son, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Chang-jin Kang's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a leading inventor in the

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…