The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Oct. 31, 2006
Sung-chan Park, Seoul, KR;
Chang-jin Kang, Seongnam-si, KR;
Sung-chan Park, Seoul, KR;
Chang-jin Kang, Seongnam-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
A method of forming a contact hole includes forming a plurality of lower patterns on a substrate. An insulation layer is formed on the lower patterns. A self-assemble induction layer is formed on the insulation layer. A recess is formed in the self-assemble induction layer in alignment with the lower patterns. A block copolymer layer is formed in the recess to form a polymer domain at a distance from a sidewall of the recess and a polymer matrix surrounding the polymer domain. The polymer domain is removed. The self-assemble induction layer is etched using the polymer matrix as a mask to form an opening through the self-assemble induction layer to expose the insulation layer. The insulation layer exposed by the opening is etched using the self-assemble induction layer as a mask so as to form a contact hole.