Fremont, CA, United States of America

Camelia Rusu

This inventor holds 16 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Silicon Etching Techniques. Top assignee: Lam Research Corporation. Active years: 2005-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Camelia Rusu. Retrieved from https://idiyas.com/inventor/camelia-rusu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 81.3

 

Average Co-Inventor Count = 3.3

ph-index = 6

Forward Citations = 90(Granted Patents)


Location History:

  • Pleasanton, CA (US) (2013 - 2016)
  • Fremont, CA (US) (2005 - 2018)

Company Filing History:


Years Active: 2005-2018

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Areas of Expertise:
Silicon Structure
Deep Silicon Etch
Profile Control
Hard Mask Material
Pressure Control Valve
Gas Mixing
Etch Rate
RF Switching
High Aspect Ratio Etch
Plasma Processing
Photoresist Distortion
Multiple Frequency Plasma
16 patents (USPTO):Explore Patents

Title: Inventor Camelia Rusu: Pioneering Innovations in Fremont

Introduction: Camelia Rusu is a visionary inventor based in Fremont, California, known for her groundbreaking contributions to the field of technology and beyond.

Latest Patents: Camelia Rusu holds several patents in various industries, including artificial intelligence, renewable energy, and healthcare technologies.

Career Highlights: With a career spanning over two decades, Camelia Rusu has been at the forefront of innovation, leading research and development teams in creating cutting-edge solutions that have revolutionized the way we live and work.

Collaborations: Throughout her career, Camelia Rusu has collaborated with top research institutions, leading companies, and brilliant minds from around the world to bring her ideas to life and make a lasting impact on society.

Conclusion: Camelia Rusu's passion for innovation, coupled with her relentless drive to push the boundaries of what is possible, continues to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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