The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Aug. 22, 2003
Raj Dhindsa, San Jose, CA (US);
S. M. Reza Sadjadi, Saratoga, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
Dave Trussell, Fremont, CA (US);
Lumin LI, Fremont, CA (US);
Eric Lenz, Pleasanton, CA (US);
Camelia Rusu, Fremont, CA (US);
Mukund Srinivasan, Fremont, CA (US);
Aaron Eppler, Fremont, CA (US);
Jim Tietz, Fremont, CA (US);
Jeffrey Marks, San Jose, CA (US);
Raj Dhindsa, San Jose, CA (US);
S. M. Reza Sadjadi, Saratoga, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
Dave Trussell, Fremont, CA (US);
Lumin Li, Fremont, CA (US);
Eric Lenz, Pleasanton, CA (US);
Camelia Rusu, Fremont, CA (US);
Mukund Srinivasan, Fremont, CA (US);
Aaron Eppler, Fremont, CA (US);
Jim Tietz, Fremont, CA (US);
Jeffrey Marks, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A workpiece is processed with a plasma in a vacuum plasma processing chamber by exciting the plasma at several frequencies such that the excitation of the plasma by the several frequencies simultaneously causes several different phenomena to occur in the plasma. The chamber includes central top and bottom electrodes and a peripheral top and/or bottom electrode arrangement that is either powered by RF or is connected to a reference potential by a filter arrangement that passes at least one of the plasma excitation frequencies to the exclusion of other frequencies.