Sunnyvale, CA, United States of America

Felix Leib Kozakevich

USPTO Granted Patents = 57 

 

Average Co-Inventor Count = 4.6

ph-index = 16

Forward Citations = 978(Granted Patents)

Forward Citations (Not Self Cited) = 939(Dec 10, 2025)


Company Filing History:


Years Active: 1999-2025

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Areas of Expertise:
Plasma Processing
Radiofrequency Signal Filter
Electrostatic Chuck
Power Delivery Optimization
Ion Energy Control
Impedance Matching
Plasma Density Profile
Uniformity Control
High Aspect Ratio Etch
Multi Frequency Plasma Processor
Edge Sheath Control
Cooling-Gas Light-Up Prevention
57 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Felix Leib Kozakevich

Introduction

Felix Leib Kozakevich is a notable inventor based in Sunnyvale, California, recognized for his significant contributions to the field of plasma processing technology. With an impressive portfolio of 51 patents, Kozakevich has made substantial advancements that enhance the efficiency and uniformity of processes in semiconductor manufacturing.

Latest Patents

Among Kozakevich's latest innovations are two pivotal patents:

1. **Systems and methods for using binning to increase power during a low frequency cycle** - This method aims to achieve uniformity in the etch rate by analyzing voltage signals and adjusting the frequency of a radio frequency generator. It involves receiving a voltage signal, determining its crossings, and dividing the signal's cycle into bins to optimize the etch rate.

2. **Process control for ion energy delivery using multiple generators and phase control** - This patent introduces a comprehensive method for applying RF power in a plasma process chamber. It combines signals from multiple generators, creating a combined RF signal that approximates a sloped square wave shape for enhanced efficiency in plasma processes.

Career Highlights

Kozakevich has worked at respected organizations such as Lam Research Corporation and MKS Instruments, Inc., where he has contributed to pioneering technologies that support semiconductor fabrication processes. His work primarily focuses on plasma systems that are critical for manufacturing integrated circuits.

Collaborations

Throughout his career, Kozakevich has collaborated with esteemed colleagues, including Alexei Marakhtanov and John Patrick Holland. These partnerships have fostered an environment of innovation, allowing for the development of groundbreaking technologies that address complex challenges in the industry.

Conclusion

Felix Leib Kozakevich's extensive patent portfolio and collaborative efforts underline his impact on the semiconductor manufacturing landscape. His innovative methods not only improve process efficiency but also contribute to the advancement of technology that underpins the electronics we use today.

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