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For the Inventor, By the Inventor

Newport Coast, CA, United States of America

Jeffrey S Marks

USPTO Granted Patents = 69 

 

Average Co-Inventor Count = 4.0

ph-index = 27

Forward Citations = 2,659(Granted Patents)

Forward Citations (Not Self Cited) = 2,568(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Sunnyvale, CA (US) (1992 - 2001)
  • Santa Monica, CA (US) (2003)
  • Chicago, IL (US) (2006)
  • San Jose, CA (US) (1994 - 2008)
  • Newport Coast, CA (US) (2010 - 2020)
  • Saratoga, CA (US) (2015 - 2023)

Company Filing History:

goldMedal32 out of 13,713 
 
Applied Materials, Inc.
 patents
silverMedal28 out of 3,777 
 
Lam Research Corporation
 patents
bronzeMedal3 out of 3 
 
Living Media, LLC
 patents
4. 6 out of 832,843 
Other
 patents

Years Active: 1992-2024

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Areas of Expertise:
Plasma Etching
Atomic Layer Deposition
High Aspect Ratio Features
Vacuum-Integrated Hardmask
Directional Deposition
Non-Volatile Metal Etching
Integrated Architecture
Chemical Mechanical Polishing
Inductive RF Coupling
Magnetic Confinement
Oxide Etch Process
MRAM Stack Patterning
69 patents (USPTO):Explore Patents
1. 12119243 - Plasma etching chemistries of high aspect ratio features in dielectrics (2024-10-15),
2. 12105422 - Photoresist development with halide chemistries (2024-10-01),
3. 11594429 - Plasma etching chemistries of high aspect ratio features in dielectrics (2023-02-28),
4. 11209729 - Vacuum-integrated hardmask processes and apparatus (2021-12-28),
5. 10831096 - Vacuum-integrated hardmask processes and apparatus (2020-11-10),
6. 10825680 - Directional deposition on patterned structures (2020-11-03),
7. 10749103 - Dry plasma etch method to pattern MRAM stack (2020-08-18),
8. 10606880 - Integrated architecture and network for arrangement and delivery of media (2020-03-31),
9. 10515816 - Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) (2019-12-24),
10. 10514598 - Vacuum-integrated hardmask processes and apparatus (2019-12-24),
11. 10374144 - Dry plasma etch method to pattern MRAM stack (2019-08-06),
12. 10304659 - Ale smoothness: in and outside semiconductor industry (2019-05-28),
13. 10186426 - Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) (2019-01-22),
14. 10096487 - Atomic layer etching of tungsten and other metals (2018-10-09),
15. 10056264 - Atomic layer etching of GaN and other III-V materials (2018-08-21),

Title: The Innovative Journey of Jeffrey S Marks

Introduction: Jeffrey S Marks, a visionary inventor based in Newport Coast, CA, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Jeffrey S Marks holds several patents in various fields, including artificial intelligence, renewable energy, and medical devices. His most recent patent involves a cutting-edge technology for enhancing data security in cloud computing systems.

Career Highlights: With a background in engineering and a passion for problem-solving, Jeffrey S Marks has enjoyed a successful career marked by numerous achievements. He has worked for leading tech companies, where he has spearheaded projects that have pushed the boundaries of innovation.

Collaborations: Throughout his career, Jeffrey S Marks has collaborated with top researchers, engineers, and scientists to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many of his projects.

Conclusion: Jeffrey S Marks continues to be a driving force in the world of innovation, with his relentless pursuit of excellence and his commitment to creating technologies that have a positive impact on society. His inventive spirit and dedication to pushing the boundaries of what is possible make him a true pioneer in the field of technology.

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