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Hsinchu, Taiwan

Burn-Jeng Lin

This inventor holds 21 USPTO granted patents and 2 published patent applications, primarily in Immersion Lithography. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., National Tsing Hua University. Active years: 2002-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Burn-Jeng Lin. Retrieved from https://idiyas.com/inventor/burn-jeng-lin-456oqimw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21 

% Patents Active = 66.7

Average Co-Inventor Count = 2.6

ph-index = 7

Forward Citations = 356(Granted Patents)


Company Filing History:

goldMedal19 out of 42,965 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal3 out of 1,308 
 
National Tsing Hua University
 patents
where one patent can have more than one assignee

Years Active: 2002-2024

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Areas of Expertise:
Defect Measurement
Semiconductor Detector
Micro Detector
Immersion Lithography
Lens Cleaning Module
Wafer Flatness
Critical Dimension Uniformity
Phase-Shifting Masks
Reticle Mask Holder
Immersion Fluid
Megasonic Exposure
Patterned Features
21 patents (USPTO):Explore Patents
1. 12142537 - Defect measurement method (2024-11-12),
2. 12009177 - Detection using semiconductor detector (2024-06-11),
3. 11335609 - Micro detector (2022-05-17),
4. 8693115 - Apparatus for method for immersion lithography (2014-04-08),
5. 8659843 - Apparatus for method for immersion lithography (2014-02-25),
6. 8488102 - Immersion fluid for immersion lithography, and method of performing immersion lithography (2013-07-16),
7. 8054444 - Lens cleaning module for immersion lithography apparatus (2011-11-08),
8. 7767984 - Resist collapse prevention using immersed hardening (2010-08-03),
9. 7700267 - Immersion fluid for immersion lithography, and method of performing immersion lithography (2010-04-20),
10. 7659964 - Level adjustment systems and adjustable pin chuck thereof (2010-02-09),
11. 7479466 - Method of heating semiconductor wafer to improve wafer flatness (2009-01-20),
12. 7399709 - Complementary replacement of material (2008-07-15),
13. 7384726 - Resist collapse prevention using immersed hardening (2008-06-10),
14. 7252909 - Method to reduce CD non-uniformity in IC manufacturing (2007-08-07),
15. 7234128 - Method for improving the critical dimension uniformity of patterned features on wafers (2007-06-19),

Title: The Innovative Journey of Burn-Jeng Lin

Introduction: Burn-Jeng Lin, a pioneering inventor hailing from Hsin-Chu, Taiwan, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Burn-Jeng Lin's latest patents focus on advancements in semiconductor technology, particularly in the development of cutting-edge microchips with enhanced processing capabilities and efficiency.

Career Highlights: With a career spanning over two decades, Burn-Jeng Lin has held key positions in various tech companies, leading research and development teams to create innovative solutions in the semiconductor industry. His work has been instrumental in shaping the future of technology.

Collaborations: Throughout his career, Burn-Jeng Lin has collaborated with leading researchers, engineers, and scientists from around the world, fostering a culture of innovation and knowledge sharing. His collaborative efforts have resulted in groundbreaking inventions that have revolutionized the tech industry.

Conclusion: Burn-Jeng Lin's passion for innovation and relentless pursuit of technological advancement have established him as a prominent figure in the world of inventors. His contributions continue to inspire future generations of inventors and shape the landscape of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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