Brian L Haas

Title: Innovations of Brian L Haas

Introduction

Brian L Haas is a prominent inventor based in San Jose, California. He has made significant contributions to the field of measurement and inspection technologies, holding a total of 12 patents. His work focuses on advanced methods and systems that enhance the accuracy and efficiency of substrate measurement and light scattering inspection.

Latest Patents

One of his latest patents is titled "Method and apparatus for measuring shape or thickness information of a substrate." This invention utilizes an interferometer system to measure substrate thickness or shape. The system includes two spaced apart reference flats that form an optical cavity between two parallel reference surfaces. A substrate holder is designed to place the substrate in the cavity, ensuring that the substrate surfaces are substantially parallel to the reference surfaces. The interferometer devices, located on opposite sides of the cavity, map variations in spacing through light interference.

Another notable patent is "Computer-implemented methods and systems for determining a configuration for a light scattering inspection system." This invention provides methods for creating a three-dimensional map of signal-to-noise ratio values for data acquired by a light scattering inspection system. The method identifies portions of the scattering hemisphere where the signal-to-noise ratio is higher, allowing for optimized configurations of the detection subsystem.

Career Highlights

Brian has worked with leading companies in the technology sector, including Applied Materials, Inc. and KLA-Tencor Corporation. His experience in these organizations has contributed to his expertise in measurement and inspection technologies.

Collaborations

Throughout his career, Brian has collaborated with notable professionals in the field, including Benjamin B Bierman and David S Ballance. These collaborations have further enriched his work and innovations.

Conclusion

Brian L Haas is a distinguished inventor whose contributions to measurement and inspection technologies have advanced the industry. His innovative patents and collaborations reflect his commitment to enhancing accuracy and efficiency in these fields.