The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2000

Filed:

May. 16, 1997
Applicant:
Inventors:

Benjamin Bierman, Milpitas, CA (US);

Meredith J Williams, Santa Clara, CA (US);

David S Ballance, Cupertino, CA (US);

Brian Haas, San Jose, CA (US);

Paul Deaton, San Jose, CA (US);

James V Tietz, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438706 ; 118730 ; 156345 ; 216 58 ;
Abstract

An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.


Find Patent Forward Citations

Bierman, Benjamin. (2000). Co-rotating edge ring extension for use in a semiconductor processing (U.S. Patent No. 6133152). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6133152

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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