Cupertino, CA, United States of America

David S Ballance


Average Co-Inventor Count = 4.3

ph-index = 8

Forward Citations = 1,103(Granted Patents)


Company Filing History:


Years Active: 1998-2015

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15 patents (USPTO):

Title: The Innovative Mind of David S. Ballance

Introduction

David S. Ballance, based in Cupertino, California, is an accomplished inventor with an impressive portfolio of 15 patents. His innovative contributions span various aspects of technology, showcasing his expertise and creativity in the field of engineering.

Latest Patents

Among his latest work is a patent titled "Method and System for Non-Destructive Distribution Profiling of an Element in a Film." This method focuses on determining the distribution profile of an element within a film by exciting the electron energy of a deposited element, obtaining a first spectrum, and subsequently removing a background spectrum to generate a processed spectrum. This processed spectrum is then matched to a simulated spectrum with a known distribution profile, allowing for the acquisition of a precise distribution profile of the element in the first film.

Career Highlights

David's career includes significant roles at leading technology companies, including Applied Materials, Inc. and Revera, Incorporated. His work at these firms has positioned him as a key innovator in the field, fostering advancements that impact various industrial applications.

Collaborations

During his career, David has collaborated with talented individuals such as Benjamin B. Bierman and James V. Tietz. These partnerships have contributed to the development of cutting-edge technologies and have further solidified his reputation as a leading inventor.

Conclusion

David S. Ballance continues to be a driving force in innovation with his extensive patent portfolio and significant contributions to the field of technology. His ability to articulate complex methods in practical applications exemplifies the impact that skilled inventors have on advancing industrial capabilities.

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