The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2000
Filed:
May. 16, 1997
Applicant:
Inventors:
Benjamin Bierman, Milpitas, CA (US);
David S Ballance, Cupertino, CA (US);
James V Tietz, Fremont, CA (US);
Brian Haas, San Jose, CA (US);
Meredith J Williams, Santa Clara, CA (US);
Paul Deaton, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; F27B / ; F27B / ;
U.S. Cl.
CPC ...
392416 ; 392422 ; 219390 ; 219405 ; 118725 ; 118 501 ; 25049222 ;
Abstract
In one embodiment, the invention is directed to an apparatus for preventing depositions from occurring on a reflector in a processing chamber, comprising: a cover disposed adjacent to the reflector, the cover optically transparent over a range of wavelengths in which the reflector is reflective; and at least one cover support for maintaining the position of the cover relative to the reflector.