The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2000

Filed:

May. 16, 1997
Applicant:
Inventors:

Meredith J Williams, Santa Clara, CA (US);

David S Ballance, Cupertino, CA (US);

Benjamin Bierman, Milpitas, CA (US);

Paul Deaton, San Jose, CA (US);

Brian Haas, San Jose, CA (US);

Nobuyuki Takahashi, Santa Clara, CA (US);

James V Tietz, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
117 85 ; 117 86 ; 117202 ; 118715 ;
Abstract

A method for controlling the temperature of a substrate in a processing chamber. The processing chamber employs a heating control over at least two heating zones. Each heating zone is independently controllable according to a measured signal corresponding to the substrate temperature and a user-definable offset.


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