Company Filing History:
13 out of 1,724 
1 out of 934 Years Active: 2014-2018
Title: Boxiu Cai: Innovator in Photolithography and Semiconductor Technology
Introduction
Boxiu Cai is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in photolithography. With a total of 13 patents to his name, Cai has established himself as a key figure in the industry.
Latest Patents
Cai's latest patents include innovative methods for fabricating photolithography alignment mark structures and photolithographic masks. One of his notable inventions involves a method for creating a photolithography alignment mark structure. This method includes providing a substrate and forming multiple gratings within it. It also involves aligning a mask plate with the substrate to reproduce specific grating patterns in a photoresist layer. Another significant patent focuses on the fabrication of a photolithographic mask, which includes writing layout patterns with sub-resolution assistant features to enhance adhesion to the substrate.
Career Highlights
Throughout his career, Boxiu Cai has worked with leading companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in both Shanghai and Beijing. His work has contributed to advancements in semiconductor manufacturing processes and technologies.
Collaborations
Cai has collaborated with notable colleagues in his field, including Yi Huang and Yanlei Zu. These partnerships have fostered innovation and development in semiconductor technologies.
Conclusion
Boxiu Cai's contributions to photolithography and semiconductor technology have made a lasting impact on the industry. His innovative patents and collaborations highlight his role as a leading inventor in this critical field.