The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Nov. 17, 2015
Applicant:
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Inventor:
BoXiu Cai, Shanghai, CN;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/268 (2006.01); H01L 21/20 (2006.01); H01L 21/263 (2006.01); H01L 21/26 (2006.01); H01L 21/324 (2006.01); B23K 26/04 (2014.01); B23K 26/073 (2006.01); B23K 26/08 (2014.01); G02B 27/09 (2006.01);
U.S. Cl.
CPC ...
H01L 21/268 (2013.01); H01L 21/2026 (2013.01); H01L 21/26 (2013.01); H01L 21/263 (2013.01); H01L 21/2636 (2013.01); H01L 21/324 (2013.01); B23K 26/04 (2013.01); B23K 26/0736 (2013.01); B23K 26/0738 (2013.01); B23K 26/0853 (2013.01); G02B 27/0922 (2013.01); G02B 27/0933 (2013.01); G02B 27/0955 (2013.01); G02B 27/0977 (2013.01);
Abstract
A laser annealing device for compensating wafer heat maps and its method are disclosed. A laser annealing device comprises a pump laser source array including of a plurality of pump laser sources for irradiating a tunable mask, each pump laser source emitting pump laser, an annealing laser source for emitting annealing laser and irradiating the tunable mask, and a tunable mask for transmitting at least part of the annealing laser after being irradiated by the pump laser.