The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Dec. 26, 2013
Applicant:
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Inventor:
Boxiu Cai, Shanghai, CN;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01);
Abstract
A photolithographic mask is provided. The photolithographic mask includes a substrate having a first surface configured as a light incidence plane of an exposure light and a second surface. The photolithographic mask also includes a plurality of scattering centers functioning as a refractive index disturbance inside the substrate. Further, the photolithographic mask includes a plurality of mask patterns on the second surface of the substrate.