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For the Inventor, By the Inventor

San Jose, CA, United States of America

Boris Volosskiy

This inventor holds 17 USPTO granted patents and 14 published patent applications. Top assignee: Lam Research Corporation. Active years: 2018-2026.

USPTO Granted Patents = 17 

% Patents Active = 82.4

Average Co-Inventor Count = 7.3

ph-index = 5

Forward Citations = 97(Granted Patents)


Company Filing History:

goldMedal17 out of 3,936 
 
Lam Research Corporation
 patents

Years Active: 2018-2026

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17 patents (USPTO):Explore Patents
1. 12646695 - Dry chamber clean of photoresist films (2026-06-02),
2. 12601974 - Bake strategies to enhance lithographic performance of metal-containing resist (2026-04-14),
3. 12585184 - Photoresist with multiple patterning radiation-absorbing elements and/or vertical composition gradient (2026-03-24),
4. 12510826 - Photoresist development with halide chemistries (2025-12-30),
5. 12510825 - Photoresist development with halide chemistries (2025-12-30),
6. 12437995 - Tin oxide films in semiconductor device manufacturing (2025-10-07),
7. 12436464 - Pre-exposure photoresist curing to enhance EUV lithographic performance (2025-10-07),
8. 12417916 - Tin oxide films in semiconductor device manufacturing (2025-09-16),
9. 12211691 - Dry development of resists (2025-01-28),
10. 12183589 - Tin oxide mandrels in patterning (2024-12-31),
11. 12105422 - Photoresist development with halide chemistries (2024-10-01),
12. 12094711 - Tin oxide films in semiconductor device manufacturing (2024-09-17),
13. 12062538 - Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement (2024-08-13),
14. 11355353 - Tin oxide mandrels in patterning (2022-06-07),
15. 11322351 - Tin oxide films in semiconductor device manufacturing (2022-05-03),

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Profile summary based on public USPTO records.
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