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For the Inventor, By the Inventor

San Jose, CA, United States of America

Boris Volosskiy

This inventor holds 17 USPTO granted patents and 14 published patent applications, primarily in Photoresist Development. Top assignee: Lam Research Corporation. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Boris Volosskiy. Retrieved from https://idiyas.com/inventor/boris-volosskiy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 82.4

Average Co-Inventor Count = 7.3

ph-index = 5

Forward Citations = 97(Granted Patents)


Company Filing History:

goldMedal17 out of 3,955 
 
Lam Research Corporation
 patents

Years Active: 2018-2026

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Areas of Expertise:
Photoresist
Lithography
Tin Oxide
EUV
Halide Chemistries
Patterning
Semiconductor Manufacturing
Atomic Layer Etching
Curing Strategies
Metal-Containing Resist
Gapfill Features
17 patents (USPTO):Explore Patents
1. 12646695 - Dry chamber clean of photoresist films (2026-06-02),
2. 12601974 - Bake strategies to enhance lithographic performance of metal-containing resist (2026-04-14),
3. 12585184 - Photoresist with multiple patterning radiation-absorbing elements and/or vertical composition gradient (2026-03-24),
4. 12510826 - Photoresist development with halide chemistries (2025-12-30),
5. 12510825 - Photoresist development with halide chemistries (2025-12-30),
6. 12437995 - Tin oxide films in semiconductor device manufacturing (2025-10-07),
7. 12436464 - Pre-exposure photoresist curing to enhance EUV lithographic performance (2025-10-07),
8. 12417916 - Tin oxide films in semiconductor device manufacturing (2025-09-16),
9. 12211691 - Dry development of resists (2025-01-28),
10. 12183589 - Tin oxide mandrels in patterning (2024-12-31),
11. 12105422 - Photoresist development with halide chemistries (2024-10-01),
12. 12094711 - Tin oxide films in semiconductor device manufacturing (2024-09-17),
13. 12062538 - Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement (2024-08-13),
14. 11355353 - Tin oxide mandrels in patterning (2022-06-07),
15. 11322351 - Tin oxide films in semiconductor device manufacturing (2022-05-03),

I specialize in innovations, inventions, inventors, patent attorneys, assignees, and patents only.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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