The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Mar. 31, 2021
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Timothy William Weidman, Sunnyvale, CA (US);
Kevin Li Gu, Mountain View, CA (US);
Chenghao Wu, San Jose, CA (US);
Katie Lynn Nardi, San Jose, CA (US);
Boris Volosskiy, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/168 (2013.01); G03F 7/0043 (2013.01);
Abstract
Disclosed herein are methods and apparatuses for exposing an organic metal-oxide film to a blanket UV treatment prior to a lithographic patterning operation. A blanket UV treatment may be used to shift a solubility curve of the film, such that a lower EUV dose may be used to pattern the film. Additionally, a blanket UV treatment may be used after development to further cure the film.