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For the Inventor, By the Inventor

Los Gatos, CA, United States of America

Biagio Gallo

USPTO Granted Patents = 33

Average Co-Inventor Count = 6.7

ph-index = 22

Forward Citations = 4,927(Granted Patents)


Location History:

  • Los Gatos, CA (US) (2003 - 2010)
  • Palo Alto, CA (US) (2005 - 2014)

Company Filing History:

goldMedal33 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2003-2014

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33 patents (USPTO):Explore Patents
1. 8900405 - Plasma immersion ion implantation reactor with extended cathode process ring (2014-12-02),
2. 8168519 - Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces (2012-05-01),
3. 7989329 - Removal of surface dopants from a substrate (2011-08-02),
4. 7968439 - Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces (2011-06-28),
5. 7732309 - Plasma immersed ion implantation process (2010-06-08),
6. 7700465 - Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage (2010-04-20),
7. 7666464 - RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor (2010-02-23),
8. 7642180 - Semiconductor on insulator vertical transistor fabrication and doping process (2010-01-05),
9. 7465478 - Plasma immersion ion implantation process (2008-12-16),
10. 7429532 - Semiconductor substrate process using an optically writable carbon-containing mask (2008-09-30),
11. 7428915 - O-ringless tandem throttle valve for a plasma reactor chamber (2008-09-30),
12. 7422775 - Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing (2008-09-09),
13. 7393765 - Low temperature CVD process with selected stress of the CVD layer on CMOS devices (2008-07-01),
14. 7335611 - Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer (2008-02-26),
15. 7323401 - Semiconductor substrate process using a low temperature deposited carbon-containing hard mask (2008-01-29),

Title: The Innovations of Biagio Gallo in Plasma Technology

Introduction

Biagio Gallo, a prominent inventor based in Los Gatos, CA, has made significant contributions to the field of plasma technology, evidenced by his impressive portfolio of 33 patents. His work focuses on advancing ion implantation techniques, which are crucial for semiconductor manufacturing and improving the efficiency of various electronic devices.

Latest Patents

Among Biagio Gallo's latest innovations is a patent for a Plasma Immersion Ion Implantation Reactor with Extended Cathode Process Ring. This invention introduces a process ring for the wafer support pedestal of a toroidal source plasma immersion ion implantation reactor. It enhances edge uniformity by providing a continuous surface that extends beyond the wafer edge. Additionally, he has developed a method that utilizes a pure or nearly pure silicon seasoning layer on the interiors of chamber surfaces in plasma immersion ion implantation. This technique, employing a high RF bias voltage on an electrostatic chuck, allows for achieving precise implant depth profiles, markedly improving the efficiency of the process.

Career Highlights

Biagio Gallo currently works for Applied Materials, Inc., a leader in providing the materials engineering solutions used to manufacture semiconductor chips. Throughout his career, he has been at the forefront of innovations in plasma technology, solidifying his status as an expert in the field. His contributions have had a substantial impact on the advancement of semiconductor manufacturing processes.

Collaborations

In addition to his individual accomplishments, Biagio collaborates with talented peers in his field, including Kartik Ramaswamy and Hiroji Hanawa. Working together, they explore novel concepts and drive innovation in plasma-based technologies that push the boundaries of what is achievable in semiconductor fabrication.

Conclusion

Biagio Gallo's extensive work and numerous patents showcase his dedication to advancing plasma technology in the semiconductor industry. His innovative methods not only enhance the manufacturing processes but also contribute to the continual evolution of electronic devices. His expertise and collaborative spirit are invaluable assets to the field, paving the way for future advancements in this critical area of technology.

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