Osaka, Japan

Atsushi Ogawa

This inventor holds 28 USPTO granted patents and 1 published patent application and 4 EPO patents, primarily in Nitride Semiconductor Technology. Top assignees: Sharp Kabushiki Kaisha Corporation, Sumitomo Special Metals Co., Ltd., Neomax Co., Ltd.. Active years: 2001-2019.

USPTO Granted Patents = 28 

% Patents Active = 78.6

 

Average Co-Inventor Count = 2.8

ph-index = 8

Forward Citations = 231(Granted Patents)


Location History:

  • Osaka-fu, JP (2001)
  • Mishima-gun, JP (2002 - 2006)
  • Nara, JP (2002 - 2010)
  • Tenri, JP (2002 - 2010)
  • Mihara, JP (2010)
  • Higashihiroshima, JP (2010 - 2011)
  • Sakai, JP (2017)
  • Osaka, JP (2002 - 2019)

Company Filing History:


Years Active: 2001-2019

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Areas of Expertise:
Nitride Semiconductor
Light Emitting Device
Display Control
Dipeptidyl Peptidase Inhibitors
Compound Semiconductor
Powder Compacting
Laser Light Source
Efficient Light Extraction
Manufacturing Methods
Transistor Element
Sintered Magnet
Magnetic Powder
28 patents (USPTO):Explore Patents

Title: Atsushi Ogawa: Pioneering Inventor from Osaka

Introduction: Atsushi Ogawa is a renowned inventor hailing from Osaka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ogawa's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles and cutting-edge medical devices for non-invasive diagnostics.

Career Highlights: With over two decades of experience in research and development, Ogawa has worked with leading tech companies in Japan, spearheading projects that have revolutionized various industries.

Collaborations: Throughout his career, Ogawa has collaborated with top universities and research institutions in Japan, fostering a culture of innovation and knowledge-sharing in the scientific community.

Conclusion: Atsushi Ogawa's relentless pursuit of innovation and his commitment to pushing the boundaries of technology make him a true trailblazer in the world of inventions.

Profile summary based on public USPTO records.
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