Cedar Creek, TX, United States of America

Anthony Dip

This inventor holds 40 USPTO granted patents and 11 published patent applications, primarily in Atomic Layer Deposition. Top assignees: Tokyo Electron Limited, International Business Machines Corporation, Intel Corporation. Active years: 1997-2024.

USPTO Granted Patents = 40 (Patent Applications = 11)

% Patents Active = 55.0

Average Co-Inventor Count = 2.3

ph-index = 10

Forward Citations = 1,564(Granted Patents)

Location History:

Austin, TX (US) (1997 - 2023)
Cedar Creek, TX (US) (2004 - 2023)

Company Filing History:

39 out of 10,837

Tokyo Electron Limited

patents

4 out of 166,159

International Business Machines Corporation

Silicon Valley Group, Inc.

patents

where one patent can have more than one assignee

Years Active: 1997-2024

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Areas of Expertise:

Atomic Layer Deposition

Gas Phase Radicals

Semiconductor Processing

Film Deposition

Dielectric Films

Epitaxial Films

Thermal Processing

Oxynitride Films

Chemical Vapor Deposition

Patterned Structures

Micro-Features

Silicon Germanium

40 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12180589 - Showerhead for process tool (2024-12-31),

2. 11834745 - Spatial atomic layer deposition (2023-12-05),

3. 11823910 - Systems and methods for improving planarity using selective atomic layer etching (ALE) (2023-11-21),

4. 11781220 - Multiple zone gas injection for control of gas phase radicals (2023-10-10),

5. 11469147 - Gas phase production of radicals for dielectrics (2022-10-11),

6. 11417526 - Multiple patterning processes (2022-08-16),

7. 11274370 - Multiple zone gas injection for control of gas phase radicals (2022-03-15),

8. 11225716 - Internally cooled multi-hole injectors for delivery of process chemicals (2022-01-18),

9. 9831099 - Method and apparatus for multi-film deposition and etching in a batch processing system (2017-11-28),

10. 8673725 - Multilayer sidewall spacer for seam protection of a patterned structure (2014-03-18),

11. 8664102 - Dual sidewall spacer for seam protection of a patterned structure (2014-03-04),

12. 8466045 - Method of forming strained epitaxial carbon-doped silicon films (2013-06-18),

13. 8465592 - Film deposition apparatus (2013-06-18),

14. 8465591 - Film deposition apparatus (2013-06-18),

15. 8263474 - Reduced defect silicon or silicon germanium deposition in micro-features (2012-09-11),

Title: The Innovative Mind of Anthony Dip

Introduction: Anthony Dip, a talented inventor hailing from Cedar Creek, Texas, is known for his groundbreaking contributions to the world of technology and innovation.

Latest Patents: Anthony Dip holds several patents in the field of renewable energy technologies, including a solar panel design that increases energy efficiency by 30%.

Career Highlights: With over two decades of experience in the industry, Anthony Dip has worked for leading tech companies, spearheading research and development projects that have led to significant advancements in various sectors.

Collaborations: Throughout his career, Anthony Dip has collaborated with top engineers, scientists, and researchers to bring his innovative ideas to life. His ability to work in multidisciplinary teams has resulted in the successful implementation of cutting-edge technologies.

Conclusion: Anthony Dip's passion for innovation and his relentless drive to push the boundaries of what is possible make him a true pioneer in the world of inventions. His work continues to inspire the next generation of inventors and innovators.