The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Aug. 04, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Anthony Dip, Austin, TX (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/02 (2006.01); C23C 16/50 (2006.01); C23C 16/30 (2006.01); C23C 16/458 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); C23C 16/308 (2013.01); C23C 16/4584 (2013.01); C23C 16/45565 (2013.01); C23C 16/50 (2013.01); H01L 21/0214 (2013.01); H01L 21/0228 (2013.01); H01L 21/02181 (2013.01); H01L 21/02274 (2013.01);
Abstract
A method for depositing a dielectric material includes heating a substrate disposed in a dielectric deposition chamber; dispensing a dielectric precursor from a first showerhead towards a major outer surface of the substrate; dispensing a mixture containing oxygen and ammonia from a second showerhead towards the major outer surface of the substrate; and reacting the dielectric precursor with the mixture to deposit a layer of oxynitride dielectric material on the substrate.