Anbang Zhang

Title: Anbang Zhang: Innovator in Semiconductor Technology

Introduction

Anbang Zhang is a prominent inventor based in Zhuhai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on developing advanced semiconductor devices and manufacturing methods that enhance performance and efficiency.

Latest Patents

Among his latest patents is a groundbreaking invention titled "Semiconductor device with multichannel heterostructure and manufacturing method thereof." This patent describes a semiconductor device that includes a semiconductor heterostructure layer composed of alternating first and second semiconductor material layers. The design allows for the generation of a two-dimensional hole gas (2DHG) between these layers, which is crucial for improving device performance. Another notable patent is for a "Semiconductor device and fabrication method thereof," which outlines a semiconductor device featuring a III-nitride layer, a gate, and a connection structure. This innovative design aims to enhance the electrical connectivity and overall functionality of semiconductor devices.

Career Highlights

Anbang Zhang has worked with notable companies in the semiconductor industry, including Innoscience Technology Co., Ltd. in Zhuhai and Innoscience Technology Co., Ltd. in Suzhou. His experience in these organizations has allowed him to refine his expertise and contribute to cutting-edge semiconductor technologies.

Collaborations

Throughout his career, Anbang has collaborated with talented individuals such as Hao Li and Haoning Zheng. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Anbang Zhang is a distinguished inventor whose work in semiconductor technology has led to numerous patents and advancements in the field. His contributions continue to shape the future of semiconductor devices, making him a key figure in this industry.