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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10808142 B1

PDFFull Text
Date of Patent:
Oct. 20, 2020

Filed:

Mar. 19, 2018

Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Sangwon Kim, Seoul, KR;

Minsu Seol, Seoul, KR;

Hyeonjin Shin, Suwon-si, KR;

Dongwook Lee, Suwon-si, KR;

Yunseong Lee, Osan-si, KR;

Seongjun Jeong, Hwaseong-si, KR;

Alum Jung, Suwon-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Gyeonggi-do, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Caridad Everhart

Int. Cl.
CPC ...
H01L 21/027 (2006.01); C09D 165/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01); H01L 21/311 (2006.01); C01B 32/184 (2017.01); G03F 7/09 (2006.01); C01B 32/182 (2017.01); C08G 61/02 (2006.01); B82Y 40/00 (2011.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C09D 165/00 (2013.01); C01B 32/182 (2017.08); C01B 32/184 (2017.08); C08G 61/02 (2013.01); G03F 7/094 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); H01L 21/0274 (2013.01); H01L 21/31138 (2013.01); H01L 21/31144 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C08G 2261/3424 (2013.01); Y10S 977/734 (2013.01); Y10S 977/774 (2013.01); Y10S 977/842 (2013.01);
Abstract

Provided are a method of preparing a graphene quantum dot, a graphene quantum dot prepared using the method, a hardmask composition including the graphene quantum dot, a method of forming a pattern using the hardmask composition, and a hardmask obtained from the hardmask composition. The method of preparing a graphene quantum dot includes reacting a graphene quantum dot composition and an including a polyaromatic hydrocarbon compound and an organic solvent at an atmospheric pressure and a temperature of about 250° C. The polyaromatic hydrocarbon compound may include at least four aromatic rings.

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