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For the Inventor, By the Inventor

Shanghai, China

Semiconductor Manufacturing International Corp.


USPTO Granted Patents = 78


Forward Citations = 127

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88 inventors (with patents filed for the assignee):

goldMedal Zhongshan Hong (9 out of 57 patents)

silverMedal Mieno Fumitake (7 out of 40 patents)

bronzeMedal Fumitake Mieno (4 out of 33 patents)

4.  Yiming Gu (4 out of 8 patents)

5.  Zhenghao Gan (3 out of 17 patents)

6.  Chang Liu (3 out of 49 patents)

7.  Qiang Wu (3 out of 212 patents)

8.  Deyuan Xiao (3 out of 93 patents)

9.  Ling Liu (3 out of 16 patents)

10.  Wenbo Wang (3 out of 21 patents)

11.  XiNing Wang (3 out of 9 patents)

12.  JenHao Cheng (3 out of 7 patents)

13.  Yonggen He (3 out of 11 patents)

14.  Emily Yixie Shu (3 out of 7 patents)

15.  Jinghua Ni (3 out of 11 patents)


Core Competencies:
SRAM Memory Cell
Fin FET
Transistor Device
High-K Dielectric
Exposure Method
Voltage Regulator
CMOS Devices
Nanowires
Inductor Device
Chemical Mechanical Polishing
Through Silicon Via
Packaging Structures

78 patents:

1. 11552470 - Electrostatic discharge circuit (2023-01-10),
2. 10411018 - SRAM memory cell and SRAM memory with conductive interconnect (2019-09-10),
3. 9640425 - System for making and cleaning semiconductor device (2017-05-02),
4. 9633851 - Semiconductor device including small pitch patterns (2017-04-25),
5. 9606451 - Exposure apparatus, photolithographical reticles and exposure methods thereof (2017-03-28),
6. 9461172 - Method for fabricating semiconductor device (2016-10-04),
7. 9368503 - Semiconductor SRAM structures (2016-06-14),
8. 9348240 - Mask pattern alignment method and system (2016-05-24),
9. 9343958 - Voltage regulator devices and voltage regulating method (2016-05-17),
10. 9312386 - Method for forming fin FET structure with dual-stress spacers (2016-04-12),
11. 9312378 - Transistor device (2016-04-12),
12. 9312328 - Small pitch patterns and fabrication method (2016-04-12),
13. 9223229 - Exposure device and exposure method (2015-12-29),
14. 9190282 - High-K dielectric layer based semiconductor structures and fabrication process thereof (2015-11-17),
15. 9178062 - MOS transistor, fabrication method thereof, and SRAM memory cell circuit (2015-11-03),
Company Overview
Semiconductor Manufacturing International Corp. (SMIC) is a leading semiconductor foundry based in Shanghai, China, specializing in the development and manufacturing of advanced semiconductor devices. The company focuses on various core technologies, including SRAM memory cells, FinFET transistors, high-K dielectrics, and CMOS devices. SMIC plays a crucial role in the global semiconductor supply chain, providing innovative solutions that cater to diverse applications across multiple industries, including consumer electronics and telecommunications.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 13 2026

78 Patents

#43 in Shanghai

#422 in China

#9,681 in the World

Shanghai, CN
Shanghai, China

Semiconductor Manufacturing International Corp.

Forward Citations = 127

88 inventors:

goldMedal Zhongshan Hong (9 out of 57 patents)

silverMedal Mieno Fumitake (7 out of 40 patents)

bronzeMedal Fumitake Mieno (4 out of 33 patents)

4.  Yiming Gu (4 out of 8 patents)

5.  Zhenghao Gan (3 out of 17 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Semiconductor Manufacturing International Corp.. Retrieved from https://idiyas.com/company/semiconductor-manufacturing-international

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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