Location History:
- Beijing, CN (2015)
- Shanghai, CN (2014 - 2016)
Company Filing History:
4 out of 78 
2 out of 934 
2 out of 1,724 
Years Active: 2014-2016
Title: Yiming Gu: Innovator in Semiconductor Technology
Introduction
Yiming Gu is a prominent inventor based in Shanghai, China, known for his contributions to semiconductor technology. With a total of eight patents to his name, Gu has made significant advancements in exposure apparatuses and cylindrical reticle systems.
Latest Patents
Among his latest patents is the "Cylindrical Reticle System," which is designed for performing unidirectional scan-exposure. This system features a base and a center shaft, along with bearings that support the cylindrical reticle, which includes an imaging region and two non-imaging regions. Another notable patent is the "Exposure Apparatus and Exposure Method," which outlines an apparatus that includes a base and a wafer stage group. This apparatus is capable of holding wafers and moving them cyclically, while also incorporating an alignment detection unit for precise wafer alignment.
Career Highlights
Yiming Gu has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor manufacturing processes.
Collaborations
Gu has collaborated with notable colleagues such as Qiang Wu and Daniel Hu, contributing to various projects that enhance semiconductor technology.
Conclusion
Yiming Gu's innovative work in the field of semiconductor technology, particularly through his patents, showcases his significant impact on the industry. His contributions continue to influence advancements in exposure systems and reticle technology.