The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Feb. 25, 2012
Qiang Wu, Beijing, CN;
Yiming Gu, Beijing, CN;
Abstract
A photolithographic apparatus for use with a photo-resist comprises a first component that generates a first chemical substance and produces a chemical amplification action and a second component that generates a second chemical substance. The photolithographic apparatus comprises a first exposure subsystem for selectively illuminating a surface of the photo-resist using a light of a first wavelength band such that the first component generates the first chemical substance and a second exposure subsystem for uniformly illuminating the surface using a light of a second wavelength band such that the second component generates the second chemical substance. The second chemical substance reacts with the first chemical substance to reduce the mass concentration of the first chemical substance in the photo-resist and improves the contrast of a latent image of the first chemical substance formed in the photo-resist.