The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Apr. 06, 2012
Qiang Wu, Beijing, CN;
Yiming Gu, Beijing, CN;
Abstract
Embodiments relate to a method, optical module and auto-focusing system for wafer edge exposure. The optical module comprises a light source emitting light of a wavelength to expose a photoresist, an exposing optics and a mask with an aperture between the light source and the exposing optics. The light emitted from the light source passes through the mask and then reaches the exposing optics to image the aperture on the wafer edge covered with the photoresist to form a focused light spot. The positions of the light source, the mask and the exposing optics, and the size of the aperture are configured such that the optical axis of the incident light is perpendicular to the wafer surface, and the light spot completely covers the wafer edge in the radial direction of the wafer.