Skokie, IL, United States of America

Nanoink, Inc.


USPTO Granted Patents = 22

% Expired Patents = 95.5


Forward Citations = 206

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30 inventors (with patents filed for the assignee):

goldMedal Joseph S Fragala (8 out of 11 patents)

silverMedal Sylvain Cruchon-Dupeyrat (8 out of 10 patents)

bronzeMedal Michael R Nelson (6 out of 7 patents)

4.  Raymond Roger Shile (5 out of 7 patents)

5.  Hua Zhang (5 out of 22 patents)

6.  Linette Demers (5 out of 9 patents)

7.  Nabil A Amro (5 out of 6 patents)

8.  Robert Elghanian (5 out of 43 patents)

9.  Igor Touzov (4 out of 9 patents)

10.  Bjoern Rosner (3 out of 5 patents)

11.  Jason R Haaheim (3 out of 5 patents)

12.  Sandeep Disawal (3 out of 3 patents)

13.  Raymond K Eby (3 out of 3 patents)

14.  Albert Karl Henning (2 out of 10 patents)

15.  Cedric Loiret-Bernal (2 out of 3 patents)


22 patents:

Company Overview
Nanoink, Inc., based in Skokie, Illinois, specializes in advanced nanotechnology solutions, focusing on the development and manufacturing of innovative materials and devices at the nanoscale. The company is known for its expertise in areas such as nano-patterning, nanolithography, and molecular manufacturing, which have applications across various fields including electronics, biotechnology, and materials science. By leveraging cutting-edge research, Nanoink aims to push the boundaries of technology and enhance product performance in diverse industries.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 20 2026

22 Patents

#16 in Skokie, IL

#780 in Illinois

#15,051 in US

#28,807 in the World

Skokie, IL (US)
Skokie, IL, United States of America
Forward Citations = 206

30 inventors:

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Nanoink, Inc.. Retrieved from https://idiyas.com/company/nanoink

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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