The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Oct. 21, 2003
Percy Van Crocker, Chicago, IL (US);
Sylvain Cruchon-dupeyrat, Chicago, IL (US);
Linette Demers, Chicago, IL (US);
Robert Elghanian, Chicago, IL (US);
Sandeep Disawal, Chicago, IL (US);
Nabil Amro, Chicago, IL (US);
Hua Zhang, Chicago, IL (US);
Percy Van Crocker, Chicago, IL (US);
Sylvain Cruchon-Dupeyrat, Chicago, IL (US);
Linette Demers, Chicago, IL (US);
Robert Elghanian, Chicago, IL (US);
Sandeep Disawal, Chicago, IL (US);
Nabil Amro, Chicago, IL (US);
Hua Zhang, Chicago, IL (US);
NanoInk, Inc., Skokie, IL (US);
Abstract
Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips (e.g., atomic force microscope tips, etc.) for deposition of ink materials including sol-gel inks. Additive methods can be combined with subtractive methods. Holes can be filled with nanostructures. Heights of the nanostructures filling the holes can be controlled without losing control of the lateral dimensions of the nanostructures. Phase shifters on phase shifting masks (PSMs) are additively repaired with selectively deposited sol-gel material that is converted to solid oxide, which has optical transparency and index of refraction adapted for the phase shifters repaired.